Coating apparatus – Gas or vapor deposition – With treating means
Patent
1994-12-06
1996-03-19
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
C23C 1600
Patent
active
055000479
ABSTRACT:
A surface adsorption apparatus for dissociating H.sub.2 molecules into atomic hydrogen in a vacuum vessel and adsorbing the atomic hydrogen on a sample surface is disclosed. A vacuum tube is mounted in the vacuum vessel. A nozzle is connected to the vacuum tube having a plurality of bent portions. A heating member receives electrical power from a power supply source and heats the nozzle to a predetermined temperature. A heat shielding member is located in a path of the atomic hydrogen between one end of the nozzle and the sample surface for shielding the sample surface from heat radiating from the nozzle. The H.sub.2 molecules collide with inner wall surfaces of the bent portions to be readily dissociate into the atomic hydrogen. The atomic dissociated hydrogen propagates toward the sample surface and is adsorbed on the sample surface. Since the nozzle comprises bent portions, H.sub.2 molecules frequently collide with inner wall surfaces of the nozzle to readily dissociate into atomic hydrogen. The H.sub.2 collision efficiency is significantly improved by increased surface collisions with the bent portions. Because the bent portions of the nozzle are heated by the heating member, the construction of the apparatus is simplified.
REFERENCES:
patent: 4237151 (1980-12-01), Strongin
patent: 4522674 (1985-06-01), Ninomiya
patent: 4699085 (1987-10-01), Purdes
patent: 4901667 (1990-02-01), Suzuki
SHOP NOTES, Simple Course Of Atomic Hydrogen for Ultrahigh Vacuum Applications, U. Bischer and E. Bertel, pp. 458-460, J. Vac. Sci. Tehcno. A1(2) Mar./Apr. 1993.
Webster's New Collegiate Dictionary, p. 164 G&C Merriam Co., Springfield, Mass. .COPYRGT.1975.
Ha Jeong-Sook
Lee El-Hang
Park Kang-Ho
Park Seong-Ju
Bueker Richard
Electronics & Telecommunications Research Institute
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