Apparatus for adjusting a semiconductor wafer by electron beam i

Details Apparatus for adjusting a semiconductor wafer by electron beam i Apparatus for adjusting a semiconductor wafer by electron beam i

1976-05-07

1978-02-14

Powell, William A.

Stock material or miscellaneous articles

Structurally defined web or sheet

Including aperture

156657, 156659, 156662, 427 82, 427240, 427271, 427309, 428173, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

040739902

ABSTRACT:
An apparatus and process is disclosed for the adjustment of a semiconductor wafer by electron beam illumination. An adjustment mark is provided in a semiconductor wafer having a first layer thereon. The mark is formed as a recess which extends through an aperture in the first layer and into the semiconductor wafer. The width of the recess is not greater than its depth. An electron sensitive lacquer layer is provided on the first layer and in a bottom of the recess.

REFERENCES:
patent: 3705060 (1972-12-01), Stork
patent: 3759767 (1973-09-01), Walls
patent: 3783228 (1974-01-01), Tarui et al.
patent: 3875414 (1975-04-01), Prior

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