Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1986-08-25
1989-04-11
Rosenberger, Richard A.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
356356, 356363, G03F 900, H01L 2168
Patent
active
048200557
ABSTRACT:
The present invention is directed to positioning a mask having an adjustment mark relative to a semi-conductor wafer being provided with at least one lattice structure and is concerned with keeping the area of the adjustment mark and mask as small as possible and providing an easy distinguishing of the direction of misalignment therebetween. The adjustment mark comprises at least two groups of gratings having different grid directions. In order to distinguish between misalignment which occurs in opposite directions, different grid spacings are provided. Preferably, the patterns are in strips and the adjustment mark comprises strips.
REFERENCES:
patent: 4211489 (1980-07-01), Kleinknecht et al.
patent: 4422763 (1983-12-01), Kleinknecht
"Experimental Evaluation of Interferometric Alignment Techniques for Multiple Mask Registration", by T. M. Lyszczarz, J. Vac. Sci. Technol., vol. 19, No. 4, Nov./Dec. 1981, pp. 1214-1218.
"Submicron Photolithography with 10:1 Projection Printing", by W. Arden, Siemens Forsch-u. Entwickl.-Ber., vol. 11, No. 4, 1982, pp. 169-1973.
Rosenberger Richard A.
Siemens Aktiengesellschaft
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