Heating – Work chamber having heating means – Work chamber having gaseous material supply or removal...
Patent
1996-03-15
1997-09-23
Bennett, Henry A.
Heating
Work chamber having heating means
Work chamber having gaseous material supply or removal...
432241, 432200, F27B 504
Patent
active
056697686
ABSTRACT:
An improved apparatus is provided for adjusting a gas injector of a furnace in connection with oxidation, diffusion and heat treating in semiconductor processing. The apparatus includes a reaction tube for serving as a reaction chamber and heat sink. The gas injector is coupled to the reaction tube on one end and includes openings on the other end for passing source gas. An elongated open tube is secured to the gas injector and has its axis superimposed approximately on the axis of the gas injector.
REFERENCES:
patent: 5022853 (1991-06-01), Powell et al.
patent: 5247972 (1993-09-01), Tetreault
Chen Ben
Houn Edward
Lin Yu-Tsai
Bennett Henry A.
Lu Jiping
United Microelectronics Corp.
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