Apparatus for adjusting a focal position of an electron beam and

Details Apparatus for adjusting a focal position of an electron beam and Apparatus for adjusting a focal position of an electron beam and

1992-10-29

1993-12-21

Berman, Jack I.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

H01J 37141

Patent

active

052723470

ABSTRACT:
An electron beam projection apparatus providing a magnetic refocusing lens for adjusting a focal position of an electron beam on an object. An axis of an auxiliary magnetic field produced by the magnetic refocusing lens is required equivalently to agree to that of a convergent magnetic field produced by a magnetic object lens. An inclination adjustment apparatus of the magnetic refocusing lens provides a rolling mechanism being independently rotatable on two axes being perpendicular to each other and also perpendicular to a direction of an axis of a convergent magnetic field. With this inclination adjustment apparatus, adjustment operation is improved.

REFERENCES:
patent: 4306149 (1981-12-01), Le Poole et al.
patent: 4968893 (1990-11-01), Yasuda et al.
"Numerical Analysis of Electron Beam Lithography Systems. Part I: Computation of Fields in Magnetic Deflectors", Munro et al., Optik, vol. 60, No. 4, Mar. 1982, pp. 371-390.

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