Apparatus for a dual thickness floating gate memory cell

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 235, 357 54, 357 59, H01L 2978

Patent

active

051536919

ABSTRACT:
A semiconductor integrated circuit device is disclosed having first and second conducting layers, with the first layer having a shape which enhances field emission tunneling off of the surface thereof. A dual thickness dielectric layer separates the conducting layers. When a potential difference is applied between the conducting layers, field emission tunneling occurs primarily through the thinner portion of the dielectric layer. A method for forming a semiconductor integrated circuit device comprises the steps of (a) forming a first conducting layer, (b) forming regions of enhanced field emission on said first conducting layer, (c) forming a second insulating layer on the first conducting layer, (d) forming a masking layer (e) undercutting the second insulating layer, (f) etching the first conducting layer according to the masking pattern, (g) forming a third insulating layer on all exposed surfaces of the first conducting layer, such that a resultant insulating layer has first and second regions of different thicknesses, and (h) forming a second conducting layer over said resultant insulating layer.

REFERENCES:
patent: 4274012 (1981-06-01), Simko
patent: 4300212 (1981-11-01), Simko
patent: 4462090 (1984-07-01), Iizuka
patent: 4486769 (1984-12-01), Simko
patent: 4794433 (1988-12-01), Kamiya et al.
Muller et al, Device Electronics for IC's, 1986, pp. 452-454.
Heimann, P. A., et al., "Electrical Conduction and Breakdown in Oxides of Poly-Crystalline Silicon and Their Correlation with Interface Texture", Journal of Applied Physics 53(9), Sep. 1982, pp. 6240-6245, American Institute of Physics.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for a dual thickness floating gate memory cell does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for a dual thickness floating gate memory cell, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for a dual thickness floating gate memory cell will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1193809

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.