Apparatus employing an aqueous solution

Details Apparatus employing an aqueous solution Apparatus employing an aqueous solution

1985-06-17

1989-05-30

Kalafut, Stephen J.

Chemistry: electrical current producing apparatus, product, and

Having magnetic field feature

429 26, 422 19, H07M 800, H07M 818

Patent

active

048350729

ABSTRACT:
An apparatus, such as a fuel cell powerplant 10 or a boiler 168, having a flow path for an aqueous solution and a method for operating the apparatus are disclosed. The aqueous solution includes water, iron based compounds, and ferric hydrous oxide of a character that retards the deposition of iron based compounds on the interior of the conduit.

REFERENCES:
patent: 1368748 (1921-02-01), Penniman, Jr. et al.
patent: 1520823 (1924-12-01), Kestner
patent: 3904540 (1975-09-01), Bennetch et al.
patent: 3912646 (1975-10-01), Leitner et al.
patent: 3919404 (1975-11-01), Beck
patent: 3923546 (1975-12-01), Katz et al.
patent: 3929468 (1975-12-01), Siemens et al.
patent: 3931025 (1976-01-01), Woditsch et al.
patent: 3940285 (1976-02-01), Nickols, Jr. et al.
patent: 3946103 (1976-03-01), Hund
patent: 3964929 (1976-06-01), Grevstad
patent: 4006090 (1977-02-01), Beck
patent: 4112063 (1978-09-01), Buxbaum et al.
patent: 4123501 (1978-10-01), Kohler et al.
patent: 4344849 (1982-08-01), Grasso et al.
patent: 4361486 (1982-11-01), Hou et al.
patent: 4430228 (1984-02-01), Paterson
patent: 4451361 (1984-05-01), Paterson
patent: 4451506 (1984-05-01), Kobayashi et al.
Crystal Nucleation in Fe(III) Solutions and Hydroxide Gels, J. Inorg. Nucl. Chem., 1968, vol. 30, pp. 2371-2381.

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