Apparatus comprising an electrostatic wafer cassette

Details Apparatus comprising an electrostatic wafer cassette Apparatus comprising an electrostatic wafer cassette

1990-05-10

1991-03-12

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504401, 2504531, 361234, H01J 3720

Patent

active

049995073

ABSTRACT:
Disclosed is apparatus comprising an electrostatic cassette assembly for securing a semiconductor wafer during lithographic processing such as direct-write particle-beam lithography. The cassette assembly comprises a cassette body and an electrostatic chuck installable in, and removeable from, the cassette body. The electrostatic chuck comprises a charge plate having a thin dielectric layer on its upper surface, against which the wafer is flattened by Coulombic force. Charge storage means are included for maintaining an electrical potential difference between the wafer and the charge plate even in the absence of connection to a source of electrical energy external to the assembly.

REFERENCES:
patent: 4412133 (1983-10-01), Eckes et al.
patent: 4480284 (1984-10-01), Tojo et al.
patent: 4502094 (1985-02-01), Lewin et al.
Rev. Sci. Instrum., vol. 44, No. 10, Oct. 1973, "Electrostatic Wafer Chuck for Electron Beam Microfabrication," by George A. Wardly, pp. 1506-1509.

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