Apparatus comprising a high-vacuum chamber

Details Apparatus comprising a high-vacuum chamber Apparatus comprising a high-vacuum chamber

1988-11-23

1989-10-17

Capossela, Ronald C.

Refrigeration

Low pressure cold trap process and apparatus

55269, 417901, B01D 800

Patent

active

048738336

ABSTRACT:
Apparatus comprising a bakeable high vacuum system using cryopumps is disclosed. Auxiliary cooling means in thermal contact with the primary pumping stage of the cryopump remove heat from the cryopump, whereby the walls of the cryopump may be heated during operation of the cryopump, such that the cryopump can be baked. This can result in substantially improved attainable pressure in the system.

REFERENCES:
patent: 3252652 (1966-05-01), Trendelenburg et al.
patent: 3423947 (1969-01-01), Moriya
patent: 3443390 (1969-05-01), Webb
patent: 3579998 (1971-05-01), Thibault et al.
patent: 3585807 (1971-06-01), Hevgevoss
patent: 3769806 (1973-11-01), Boissin et al.
patent: 4514204 (1985-04-01), Bonney et al.
patent: 4538423 (1985-09-01), Le Diouron
patent: 4559787 (1985-12-01), Batzer et al.
patent: 4607491 (1986-08-01), Ishimaru et al.
M. Michaud and L. Sanche "Characteristics of a Bakeable Ion-Cryopumped UHV System," J. Vac. Sci. Technol., 17(1), Jan./Feb. 1980, pp. 274-276.

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