Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2005-01-04
2005-01-04
Lund, Jeffrie R. (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S666000, C118S696000, C118S697000
Reexamination Certificate
active
06837938
ABSTRACT:
An apparatus for use with a deposition chamber includes a temperature control system that communicates with a heating element of the deposition chamber so as to not cause the formation of a thin layer exhibiting a substantially uniform property on an active surface of a semiconductor substrate. The apparatus causes uneven heat distribution across the surface of the substrate. The apparatus may also include a feedback control system that communicates with the temperature control system so as to cause the temperature control system to alter the heat output by the heating element and, thereby, to enhance the uniformity of at least one property of the material layer being deposited.
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Mercaldi Garry Anthony
Powell Don Carl
Micro)n Technology, Inc.
TraskBritt
LandOfFree
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