Apparatus and process for washing wafers

Details Apparatus and process for washing wafers Apparatus and process for washing wafers

1992-07-09

1994-03-08

Chaudhuri, Olik

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 254, 437946, H01L 21306, B08B 308

Patent

active

052923738

ABSTRACT:
An apparatus for washing a wafer, having a wafer-washing tank holding a washing liquid and receiving a wafer, a washing-liquid inlet provided in a first part of the sidewall of the tank, a washing-liquid outlet provided in a second part of the sidewall of the tank opposite to the first part of the sidewall, and a device holding the wafer in the tank so that the wafer is parallel to the level of the washing liquid when the wafer is immersed into or positioned in the washing liquid in the tank, and a device producing an essentially horizontal flow of the washing liquid in the tank. A process for washing a wafer, having the steps of producing a horizontal flow of the washing liquid in the tank, immersing a wafer cassette holding the wafer into the washing liquid in the tank so that the wafer is parallel to the level of the washing liquid in the tank, and subsequently positioning the cassette in the washing liquid in the tank so that the wafer is parallel to the level of the washing liquid in the tank. No free particulates which have detached from the back surface of either of adjacent wafers pollute the other wafer.

REFERENCES:
patent: 4816081 (1989-03-01), Mehta et al.
patent: 4869278 (1989-09-01), Bran
patent: 4984597 (1991-01-01), McConnell et al.
patent: 5014727 (1991-05-01), Aigo
patent: 5071776 (1991-12-01), Matsushita et al.

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