Apparatus and process for the fabrication of large area thin fil

Details Apparatus and process for the fabrication of large area thin fil Apparatus and process for the fabrication of large area thin fil

1985-01-14

1986-09-16

Smith, John D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

118692, 118712, 118723, 118725, 118730, 118900, 427 74, 427 86, 4272551, 4272552, 4272553, 4272555, 427294, C23C 1308

Patent

active

046122079

ABSTRACT:
Disclosed is an apparatus for affecting the preparation of thin film transistor arrays comprised of a chamber means with a gas inlet means, and a gas exhaust means, first rotatable polygon electrode means, second stationary counterelectrode means of cylindrical shape situated coaxially with the first electrode means, and substrate means to be coated present on the first polygon electrode means.

REFERENCES:
patent: 2103623 (1937-12-01), Kott
patent: 4142004 (1979-02-01), Hauser, Jr. et al.
patent: 4342631 (1982-08-01), White et al.
patent: 4394401 (1983-07-01), Shioya et al.
patent: 4404076 (1983-09-01), Nakagawa et al.
patent: 4422407 (1983-12-01), Bessot et al.
patent: 4423133 (1983-12-01), Kanbe et al.
patent: 4438154 (1984-03-01), Kato et al.
patent: 4438188 (1984-03-01), Shimatani et al.
patent: 4466380 (1984-08-01), Jansen et al.

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