Apparatus and process for the determination of static lens...

Details Apparatus and process for the determination of static lens... Apparatus and process for the determination of static lens...

2007-11-13

2007-11-13

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Lens or reflective image former testing

C355S053000, C355S055000, C355S077000, C430S022000, C430S030000

Reexamination Certificate

active

10844939

ABSTRACT:
A process for the determination of focal plane deviation uniquely due to the lens field curvature associated with a photolithographic projection tool is described. A series of lithographic exposures is performed on a resist coated silicon wafer using a stepper or scanner running in static mode. The lithographic exposures produce an array of focusing fiducials that are displaced relative to each other in a unique way. The resulting measurements are fed into a computer algorithm that calculates the lens field curvature in an absolute sense in the presence of wafer height variation and varying stage performance.

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