Apparatus and process for sensing fluoro species in...

Measuring and testing – Gas analysis – Detector detail

Reexamination Certificate

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C073S025010, C073S031060

Reexamination Certificate

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11057594

ABSTRACT:
A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.

REFERENCES:
patent: 3270232 (1966-08-01), Bailey, Jr. et al.
patent: 3464269 (1969-09-01), Froger
patent: 3523408 (1970-08-01), Rosenberg
patent: 3676293 (1972-07-01), Gruber
patent: 3892528 (1975-07-01), Fredericks
patent: 3999947 (1976-12-01), Mihara et al.
patent: 4480779 (1984-11-01), Luc
patent: 4662212 (1987-05-01), Noguchi et al.
patent: 4723438 (1988-02-01), Adler-Golden et al.
patent: 4872759 (1989-10-01), Stich-Baumeister et al.
patent: 5098864 (1992-03-01), Mahulikar
patent: 5104513 (1992-04-01), Lee et al.
patent: 5229625 (1993-07-01), Suzuki et al.
patent: 5356756 (1994-10-01), Cavicci et al.
patent: 5376255 (1994-12-01), Gumbrecht et al.
patent: 5387462 (1995-02-01), Debe
patent: 5434551 (1995-07-01), Chen et al.
patent: 5464966 (1995-11-01), Gaitan et al.
patent: 5602051 (1997-02-01), Cronin et al.
patent: 5612489 (1997-03-01), Ragsdale et al.
patent: 5679576 (1997-10-01), Kawai et al.
patent: 5693545 (1997-12-01), Chung et al.
patent: 5752410 (1998-05-01), Bernstein
patent: 5827947 (1998-10-01), Miller et al.
patent: 5827952 (1998-10-01), Mansure et al.
patent: 5841017 (1998-11-01), Baraket et al.
patent: 5849113 (1998-12-01), Murakami et al.
patent: 5907765 (1999-05-01), Lescouzeres et al.
patent: 6093308 (2000-07-01), Lewis et al.
patent: 6100587 (2000-08-01), Merchant et al.
patent: 6171378 (2001-01-01), Manginell et al.
patent: 6179413 (2001-01-01), Coulman et al.
patent: 6196052 (2001-03-01), May et al.
patent: 6202472 (2001-03-01), Wezurek et al.
patent: 6202473 (2001-03-01), Stokes et al.
patent: 6236046 (2001-05-01), Watabe et al.
patent: 6265222 (2001-07-01), DiMeo, Jr. et al.
patent: 6274198 (2001-08-01), Dautartas
patent: 6284666 (2001-09-01), Naeem et al.
patent: 6321587 (2001-11-01), Laush
patent: 6383401 (2002-05-01), Labzentis et al.
patent: 6428713 (2002-08-01), Christenson et al.
patent: 6443179 (2002-09-01), Benavides et al.
patent: 6463789 (2002-10-01), Moos et al.
patent: 6468642 (2002-10-01), Bray et al.
patent: 6499354 (2002-12-01), Najafi et al.
patent: 6553335 (2003-04-01), Huang et al.
patent: 6553354 (2003-04-01), Hausner et al.
patent: 6596236 (2003-07-01), DiMeo et al.
patent: 6618174 (2003-09-01), Parker et al.
patent: 6634213 (2003-10-01), O'Connor et al.
patent: 6637253 (2003-10-01), Dean et al.
patent: 6691554 (2004-02-01), Eastman et al.
patent: 6895805 (2005-05-01), Hoagland
patent: 7080545 (2006-07-01), Dimeo et al.
patent: 2001/0009652 (2001-07-01), Arno
patent: 2002/0029613 (2002-03-01), Stetter et al.
patent: 2002/0051132 (2002-05-01), Ohno et al.
patent: 2004/0074285 (2004-04-01), DiMeo, Jr. et al.
patent: 2005/0103097 (2005-05-01), Faltum et al.
patent: 2005/0193800 (2005-09-01), DeBoer et al.
Anderson, B. et al., Semiconductor International, Oct. 1993.
Ed. P. Hagenmuller, “Inorganic Solid Flourides”, Chemistry and Physics, Academic Press (1985).
W. Moritz, et al., “Monitoring of HF and F2 Using a FieldEffect Sensor”, Field Sensors and Actuators B24-25, 194-196 (1995).
Dr. Shigeru Kurosawa, et al., “Plasma Polymerisation of Flourine Contained PolycyclicCompunds: Its Application in Chemical Sensors”, Flourine in Coatings II, Paper 33, pp. 1-8.
Werner Moritz, et al., “Gas Sensors for Flourine Using Different Semiconductor Substrates”, The 11thEuropean Conference on Solid State Transducers, Warsaw, Poland, pp. 111-114, Sep. 21-24, 1997.
Werner Mortiz, et al., “Silicon-Based Sensor for Flourine Gas”, American Chemical Society, Chapter 10, ages 119-129 (1998).
Peters, Laura, “Residual Gas Analysis”, Semiconductor Intenrational, pp. 94-101, (Oct. 1997).
Van Zant, Peter, Chapter 8: The ten-step patterning process—Surface preparation to exposure, Microchip Fabrication: A Practical Guide to Semiconductor Processing, 5th Ed., 2004, pp. 197-203, Publisher: McGraw-Hill, Published in: New York, NY.

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