Measuring and testing – Gas analysis – Detector detail
Reexamination Certificate
2006-07-25
2006-07-25
Williams, Hezron (Department: 2856)
Measuring and testing
Gas analysis
Detector detail
C073S023200, C073S025010
Reexamination Certificate
active
07080545
ABSTRACT:
A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
REFERENCES:
patent: 3270232 (1966-08-01), Bailey, Jr. et al.
patent: 3464269 (1969-09-01), Froger
patent: 3523408 (1970-08-01), Rosenberg
patent: 3676293 (1972-07-01), Gruber
patent: 3892528 (1975-07-01), Fredericks
patent: 4662212 (1987-05-01), Noguchi et al.
patent: 4723438 (1988-02-01), Adler-Golden et al.
patent: 5356756 (1994-10-01), Cavicci et al.
patent: 5612489 (1997-03-01), Ragsdale et al.
patent: 5679576 (1997-10-01), Kawai et al.
patent: 5752410 (1998-05-01), Bernstein et al.
patent: 5827952 (1998-10-01), Mansure et al.
patent: 5841017 (1998-11-01), Baraket et al.
patent: 5849113 (1998-12-01), Murakami et al.
patent: 6202472 (2001-03-01), Wezurek et al.
patent: 6265222 (2001-07-01), DiMeo, Jr. et al.
patent: 6321587 (2001-11-01), Laush
patent: 6428713 (2002-08-01), Christenson et al.
patent: 6463789 (2002-10-01), Moos et al.
patent: 6468642 (2002-10-01), Bray et al.
patent: 6499354 (2002-12-01), Najafi et al.
patent: 6553335 (2003-04-01), Huang et al.
patent: 6553354 (2003-04-01), Hausner et al.
patent: 6637253 (2003-10-01), Dean et al.
patent: 6691554 (2004-02-01), Eastman et al.
patent: 6694800 (2004-02-01), Weckstrom et al.
patent: 6883371 (2005-04-01), Sugaya et al.
patent: 2004/0074285 (2004-04-01), Dimeo, Jr. et al.
Anderson, B., et al., Semiconductor International ,Oct. 1993.
Ed P. Hagenmuller, Inorganic Solid Fluorides, Chemistry and Physics, Academic Press 1985.
W. Moritz, et al., Sensors and Actuators B 24-25 (1995) 194-196, “Monitoring of HF and F2 using a field-effect sensor”.
Dr. Shigeru Kurosawa, et al., Fluorine in Coatings II, Paper 33, pp. 1-8, “Plasma Polymerisation of Fluorine Contained Polycyclic Compounds: Its Application in Chemical Sensors”.
Werner Moritz, et al., The 11th European Conference on Solid State Transucers, Warsaw, Poland, pp. 111-114, Sep. 21-24, 1997, “Gas Sensors for Fluorine Using Different Semiconductor Substrates”.
W. Moritz, et al., 1998 American Chemical Society, Chapter 10, pp. 119-129, “Silicon-Based Sensor for Fluorine Gas”.
Semiconductor International, “Residual Gas Analysis,” Oct. 1997, pp. 94-100.
Baum Thomas H.
Chen Ing-Shin
Chen Philip S. H.
Dimeo, Jr. Frank
King Mackenzie E.
Advanced Technology & Materials Inc.
Chappuis Margaret
Gustafson Vincent K.
Intellectual Property / Technology Law
Saint-Surin Jacques
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