Apparatus and process for production of amorphous semiconductor

Details Apparatus and process for production of amorphous semiconductor Apparatus and process for production of amorphous semiconductor

1980-12-16

1983-09-27

Edmundson, F.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

42218604, 423349, 427 93, 427124, H01L 21316, C23C 1100, C01B 3302

Patent

active

044067658

ABSTRACT:
A process for producing an amorphous semiconductor membrane. A predetermined gas is introduced into a vacuum chamber which is decomposed by a discharge phenomenon. The discharge phenomenon is caused by an electric field made up of a high frequency electric field or pulsed electric field superposed on a DC electric field.

REFERENCES:
patent: 3232745 (1966-02-01), Rummel et al.
patent: 3738828 (1973-06-01), Inoue
patent: 4125643 (1978-11-01), Reuschel et al.
patent: 4226897 (1980-10-01), Coleman
patent: 4289797 (1981-09-01), Akselrad
Zanzucchi et al., J. Applied Physics, vol. 48, pp. 5227-5236 (12/77).

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