Apparatus and process for measuring the temperature of semicondu

Details Apparatus and process for measuring the temperature of semicondu Apparatus and process for measuring the temperature of semicondu

2000-03-07

2000-12-12

Walberg, Teresa

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

392416, 118724, 374121, F27B 514

Patent

active

061602426

ABSTRACT:
An apparatus and method for determining the temperature of a semiconductor wafer in a thermal processing chamber in the presence of a radiation absorbing gas, such as a vapor, is disclosed. The apparatus includes a temperature sensing device which senses the amount of electromagnetic radiation being emitted by a wafer being heated and a gas sensing device which senses the amount of a gas present within the chamber. The system further includes a controller which is placed in communication with the temperature sensing device and the gas sensing device. The controller is configured to determine a correction factor based upon the amount of gas contained within the chamber. The correction factor in combination with information received from the temperature sensing device are then used to determine the temperature of the wafer.

REFERENCES:
patent: 5930456 (1999-07-01), Vosen
patent: 5970214 (1999-07-01), Gat

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