Apparatus and process for glow discharge comprising substrate te

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427569, 118723E, 118725, 31511121, 31511181, C23C 1402, C23C 1424, C23C 1650

Patent

active

052642569

ABSTRACT:
Disclosed is a method and apparatus for effecting glow discharge comprising an elongated electrically conductive glow bar electrode, means for applying a potential to the glow bar electrode, thereby generating ions, means for creating a flow of ions from the glow bar electrode to a second electrode, and a shield situated to block partially the flow of ions between the glow bar electrode and the second electrode, said shield having a plurality of apertures through which ions can flow between the glow bar electrode and the second electrode, each aperture having associated therewith at least one shutter, said shutters being capable of at least partially blocking the flow of ions through the apertures, each shutter individually movable to a plurality of positions to adjust the flow of ions through the apertures.

REFERENCES:
patent: 3845739 (1974-11-01), Erhart et al.
patent: 3861353 (1975-01-01), Erhart et al.
patent: 3907650 (1975-09-01), Pinsler
patent: 3911162 (1975-10-01), Erhart et al.
patent: 3914126 (1975-10-01), Pinsler
patent: 4019902 (1977-04-01), Leder et al.
patent: 4072518 (1978-02-01), Leder
patent: 4099969 (1978-07-01), Leder
patent: 4152747 (1979-05-01), Fisher
patent: 4310614 (1982-01-01), Connell et al.
patent: 4557993 (1985-12-01), Matyjakowski
patent: 4721891 (1988-01-01), Krausse
patent: 4770965 (1988-09-01), Fender et al.
patent: 4792460 (1988-12-01), Chu et al.
patent: 4959287 (1990-09-01), Pai et al.
patent: 5180434 (1993-01-01), DiDio et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and process for glow discharge comprising substrate te does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and process for glow discharge comprising substrate te, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and process for glow discharge comprising substrate te will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1847316

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.