Apparatus and process for generating, accelerating and...

Electric lamp and discharge devices – Fluent material supply or flow directing means – Plasma

Reexamination Certificate

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C313S141000, C315S111210

Reexamination Certificate

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07872406

ABSTRACT:
An apparatus and a process for generating, accelerating and propagating beams of electrons and plasma at high density, the apparatus comprising: a first dielectric tube, which contains gas; a hollow cathode, which is connected to said first dielectric tube; a second dielectric tube, which is connected to said hollow cathode and protrudes inside, and is connected to, a deposition chamber; an anode, which is arranged around said second dielectric tube, in an intermediate position; means for applying voltage to said cathode and said anode; means for evacuating the gas from the chamber; and means for spontaneous conversion of gas in the first dielectric tube into plasma.

REFERENCES:
patent: 3645786 (1972-02-01), Tannenberger et al.
patent: 4175235 (1979-11-01), Horiike et al.
patent: 4335465 (1982-06-01), Christiansen et al.
patent: 5576593 (1996-11-01), Schultheiss et al.
patent: 6054016 (2000-04-01), Tuda et al.
patent: 2005/0012441 (2005-01-01), Schulteiss et al.
Hobel M et al: “Deposition of superconducting YBaCu0 thin films by pseudospark ablation” Applied Physics Letters USA, vol. 56, No. 10, Mar. 5, 1990, pp. 973-975, XP002404719 ISSN: 0003-6951 p. 973, col. 1, lines 18-21; figure 1.
Dediu V I et al: “Deposition of MBa2Cu307-x thin films by channel-spark method” Superconductor Science & Technology UK, vol. 8, No. 3, Mar. 1995, pp. 160-164, XP002404899 ISSN: 0953-2048 the whole document.
Strikovski M et al: “Parameters that control pulsed electron beam ablation of materials and film deposition processes” Applied Physics Letters AIP USA vol. 82, No. 6, Feb. 10, 2003, pp. 853-855, XP002404900 ISSN: 0003-6951 the whole document.
Jiang Q D et al: “Deposition of YBa2Cu307-x thin films by channel-spark pulsed electron beam ablation” Thin Solid Films Switzerland, vol. 241, No. 1-2, Apr. 1, 1994, pp. 100-102, XP002404901 ISSN: 0040-6090 the whole document.
Jiang Q D et al:“Characterization and in situ fluorescence diagnostic of the deposition of YBa2Cu307-x thin films by pseudo-spark electron beam ablation” Superconductor Science & Technology UK, vol. 6, No. 8, Aug. 1993, pp. 567-572, XP002404902 ISSN: 0953-2048 abstract ; figure 1.

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