Apparatus and process for film deposition

Coating processes – Direct application of electrical – magnetic – wave – or... – Electrostatic charge – field – or force utilized

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S209000, C118S718000, C204S298240

Reexamination Certificate

active

06875478

ABSTRACT:
A film deposition apparatus equipped with a vacuum chamber, comprising a pair of rollers for vertically traveling a continuous sheet as a substrate, and a pair of sputtering cathodes for continuously depositing the film on the surfaces of the sheet in the vacuum chamber. The cathodes are vertically arranged and horizontally faced each other. The sheet is traveled between a pair of the cathodes. The apparatus and the film deposition process using it make it possible to deposit a film even on surfaces of a flexible sheet without causing problems such as defective film deposition or abnormal discharge, while ensuring stable, continuous, long-term operation.

REFERENCES:
patent: 2996412 (1961-08-01), Alexander
patent: 3959104 (1976-05-01), Fales
patent: 4419381 (1983-12-01), Yamazaki
patent: 4437324 (1984-03-01), Sando et al.
patent: 4635586 (1987-01-01), Diener et al.
patent: 4826707 (1989-05-01), Schwarz et al.
patent: 4872932 (1989-10-01), Yoshikawa et al.
patent: 5196100 (1993-03-01), Goffetre et al.
patent: 5198033 (1993-03-01), Kelley et al.
patent: 5595792 (1997-01-01), Kashiwaya et al.
patent: 5711994 (1998-01-01), Powers
patent: 6028016 (2000-02-01), Yahiaoui et al.
patent: 43 33 825 (1995-02-01), None
patent: WO 9843469 (1998-10-01), None
Patent Abstracts of Japan, vol. 011, No. 112 (P-565) (Apr. 9, 1987) re JP 61 260425 (Nov. 18, 1986), ABS only.
Patent Abstracts of Japan, vol. 011, No. 040 (P-544) (Feb. 25, 1987) re JP 61 208624 (Sep. 17, 1986), ABS only.
Patent Abstracts of Japan, vol. 016, No. 411 (C-0979) (Aug. 31, 1992) re JP 04 136167 (May 11, 1992), ABS only.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and process for film deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and process for film deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and process for film deposition will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3369607

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.