Apparatus and methods for predicting a semiconductor...

Data processing: artificial intelligence – Neural network – Learning task

Reexamination Certificate

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Reexamination Certificate

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07873585

ABSTRACT:
Apparatus and methods are provided for predicting a plurality of unknown parameter values (e.g. overlay error or critical dimension) using a plurality of known parameter values. In one embodiment, the method involves training a neural network to predict the plurality of parameter values. In other embodiments, the prediction process does not depend on an optical property of a photolithography tool. Such predictions may be used to determine wafer lot disposition.

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