Apparatus and methods for patterning a reticle blank by...

Details Apparatus and methods for patterning a reticle blank by... Apparatus and methods for patterning a reticle blank by...

2005-12-06

2005-12-06

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

C250S440110, C250S442110, C250S492200, C250S492220

Reexamination Certificate

active

06972417

ABSTRACT:
Apparatus and methods are disclosed for inscribing a pattern on a reticle blank to produce a lithography reticle. As a reticle blank is inscribed using a charged particle beam (e.g., electron beam), some of the incident charged particles pass through the reticle blank and are backscattered from underlying structure (e.g., from a stage used to hold the reticle blank during inscription). These backscattered particles reduce the pattern resolution on the reticle. The present apparatus and methods reduce the number of backscattered particles re-entering the reticle blank, thereby improving pattern resolution.

REFERENCES:
patent: 5635719 (1997-06-01), Petric
patent: 5757010 (1998-05-01), Langner
patent: 6118129 (2000-09-01), Oae et al.
patent: 6521901 (2003-02-01), Shamoun et al.
patent: 02-170410 (1990-07-01), None

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