Apparatus and methods for measuring wavefront aberrations of a m

Details Apparatus and methods for measuring wavefront aberrations of a m Apparatus and methods for measuring wavefront aberrations of a m

1997-07-24

1999-04-27

Kim, Robert

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, G01B 902

Patent

active

058985018

ABSTRACT:
Apparatus and methods are disclosed for measuring wavefront aberrations microlithography projection lenses such as i-line or excimer laser projection lenses. The apparatus comprises an argon-ion laser irradiating a Fizeau surface that reflects reference light and transmits test light. The test light is reflected by a spherical reflecting surface to pass twice through the test lens and the Fizeau surface, to interfere with the reference light. A piezoelectric element changes the fringes slightly. An image-pickup device receives the interference fringes and outputs data to a processor that calculates corresponding wavefront aberrations of the test lens. For testing an i-line lens, the argon laser can be a single-mode, 363.8 nm laser. For testing a lens used with a KrF excimer laser, the argon laser can emit second-harmonic light at 248.25 nm.

REFERENCES:
patent: 5563706 (1996-10-01), Shibuya et al.
patent: 5737079 (1998-04-01), Burge et al.

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