Radiant energy – Means to align or position an object relative to a source or...
Reexamination Certificate
2005-11-15
2005-11-15
Lee, John R. (Department: 2881)
Radiant energy
Means to align or position an object relative to a source or...
C250S492100, C250S492200, C250S492210, C250S548000, C430S022000
Reexamination Certificate
active
06965114
ABSTRACT:
Methods and apparatus for alignment of masks and wafers in charged-particle-beam (CPB) pattern-transfer use optical position sensors to determine the positions of a mask or a mask stage with respect to an axis of a CPB optical system. The optical position sensor uses optical reference marks provided on the mask or mask stage. Determination of the position of the mask of the mask stage permits a coarse alignment of the mask or the mask stage. CPB reference marks are provided on masks, mask stages, wafers, and wafer stages, permitting alignment of the mask stage or the mask with respect to the wafer stage or wafer, respectively, using the charged particle beam. The charged particle beam is scanned with respect to the wafer or wafer-stage CPB reference marks to determine a deflection corresponding to an alignment of the CPB reference marks of the mask and wafer (or mask stage and wafer stage). Use of the charged particle beam for such alignment permits a fine alignment.
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Klarquist & Sparkman, LLP
Lee John R.
Nikon Corporation
Vanore David A.
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