Apparatus and methods for high throughput and...

Details Apparatus and methods for high throughput and... Apparatus and methods for high throughput and...

2007-03-13

2007-03-13

Sines, Brian (Department: 1743)

Chemical apparatus and process disinfecting, deodorizing, preser

Control element responsive to a sensed operating condition

C422S050000, C422S051000, C422S051000, C422S063000, C422S068100, C422S081000, C422S082000, C422S105000, C422S105000, C422S105000, C422S105000, C436S043000, C436S063000, C436S164000, C436S174000, C436S180000, C436S177000, C436S178000, C073S001010, C073S001020, C073S053010, C435S283100, C435S286500, C435S286600, C435S287100, C435S287200, C435S287300, C435S288400, C435S288500, C435S288700, C204S403010, C204S403020, C204S403030, C204S193000

Reexamination Certificate

active

10371981

ABSTRACT:
An apparatus integrates one dimensional separation to another dimensional separation and automates the operation of the two dimensional separation. The first dimensional separation is performed in one column while the second dimensional separation is performed in multiple separation columns. The integration is achieved using a one-piece, a two-piece, or a three-piece interface.

REFERENCES:
patent: 5872010 (1999-02-01), Karger et al.
patent: 5954931 (1999-09-01), Maracas et al.
patent: 6167910 (2001-01-01), Chow
patent: 6391622 (2002-05-01), Knapp et al.
patent: 6468761 (2002-10-01), Yang et al.
patent: 6495016 (2002-12-01), Nawracala
patent: 6602472 (2003-08-01), Zimmermann et al.
patent: 6632655 (2003-10-01), Mehta et al.
patent: 6663833 (2003-12-01), Stave et al.
patent: 6677114 (2004-01-01), Schneider et al.
patent: 6749734 (2004-06-01), Simpson et al.

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