Optical: systems and elements – Diffraction
Patent
1999-05-07
2000-05-30
Spyrou, Cassandra
Optical: systems and elements
Diffraction
359738, 359888, 359894, 382254, 382255, 355 55, G02B 518, G02B 308, G02K 942
Patent
active
060697385
ABSTRACT:
An optical system for providing an in-focus, extended depth of field image on a projection surface includes an encoded mask or light encoder for preceding the light to include object information (or, equivalently, information about the desired image), and an extended depth of field (EDF) mask, for extending the depth of field of the projection system. In addition to including object information, the encoded mask encodes the light from the light source to account for the variations introduced by the EDF mask in extending the depth of field, so that no post processing is required.
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patent: 4804249 (1989-02-01), Reynolds et al.
patent: 5218471 (1993-06-01), Swanson et al.
patent: 5610684 (1997-03-01), Shiraishi
patent: 5748371 (1998-05-01), Cathey, Jr. et al.
patent: 5969855 (1997-03-01), Ishiwata et al.
Cathey, Jr. Wade Thomas
Dowski, Jr. Edward Raymond
Assai Fayez
Bales Jennifer L.
Spyrou Cassandra
University Technology Corporation
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