Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2004-02-23
2008-05-27
Lauchman, Layla G. (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
C356S369000, C356S445000, C356S508000
Reexamination Certificate
active
07379183
ABSTRACT:
Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets.
REFERENCES:
patent: 3594085 (1971-07-01), Wilmanns
patent: 4103998 (1978-08-01), Nakazawa et al.
patent: 4167337 (1979-09-01), Jaerisch et al.
patent: 4200395 (1980-04-01), Smith et al.
patent: 4332473 (1982-06-01), Ono
patent: 4631416 (1986-12-01), Trutna, Jr.
patent: 4647207 (1987-03-01), Bjork et al.
patent: 4703434 (1987-10-01), Brunner
patent: 4710642 (1987-12-01), McNeil
patent: 4750836 (1988-06-01), Stein
patent: 4757207 (1988-07-01), Chappelow et al.
patent: 4818110 (1989-04-01), Davidson
patent: 4820055 (1989-04-01), Muller
patent: 4828392 (1989-05-01), Nomura et al.
patent: 4848911 (1989-07-01), Uchida et al.
patent: 4929083 (1990-05-01), Brunner
patent: 4999014 (1991-03-01), Gold et al.
patent: 5112129 (1992-05-01), Davidson et al.
patent: 5114235 (1992-05-01), Suda et al.
patent: 5166752 (1992-11-01), Spanier et al.
patent: 5172190 (1992-12-01), Kaiser
patent: 5182455 (1993-01-01), Muraki
patent: 5182610 (1993-01-01), Shibata
patent: 5189494 (1993-02-01), Muraki
patent: 5191393 (1993-03-01), Hignette et al.
patent: 5276337 (1994-01-01), Starikov
patent: 5316984 (1994-05-01), Leourx
patent: 5327221 (1994-07-01), Saitoh et al.
patent: 5340992 (1994-08-01), Matsugu et al.
patent: 5343292 (1994-08-01), Brueck et al.
patent: 5355306 (1994-10-01), Waldo
patent: 5388909 (1995-02-01), Johnson et al.
patent: 5414514 (1995-05-01), Smith et al.
patent: 5416588 (1995-05-01), Ducharme et al.
patent: 5465148 (1995-11-01), Matsumoto et al.
patent: 5525840 (1996-06-01), Tominaga
patent: 5596406 (1997-01-01), Rosencwaig et al.
patent: 5596413 (1997-01-01), Stanton et al.
patent: 5608526 (1997-03-01), Pinwonka-Corle et al.
patent: 5666196 (1997-09-01), Ishii et al.
patent: 5712707 (1998-01-01), Ausschnitt et al.
patent: 5783342 (1998-07-01), Yamashita et al.
patent: 5801390 (1998-09-01), Shiraishi
patent: 5805290 (1998-09-01), Ausschnitt et al.
patent: 5808742 (1998-09-01), Everett et al.
patent: 5883710 (1999-03-01), Nikoonahad et al.
patent: 5889593 (1999-03-01), Bareket
patent: 5909333 (1999-06-01), Best et al.
patent: 5912983 (1999-06-01), Hiratsuka
patent: 5923041 (1999-07-01), Cresswell et al.
patent: 5966201 (1999-10-01), Shiraishi et al.
patent: 6013355 (2000-01-01), Chen et al.
patent: 6023338 (2000-02-01), Bareket
patent: 6046094 (2000-04-01), Jost et al.
patent: 6077756 (2000-06-01), Lin et al.
patent: 6079256 (2000-06-01), Bareket
patent: 6081325 (2000-06-01), Leslie et al.
patent: 6128089 (2000-10-01), Ausschnitt et al.
patent: 6153886 (2000-11-01), Hagiwara et al.
patent: 6160622 (2000-12-01), Dirksen et al.
patent: 6165656 (2000-12-01), Tomimatu
patent: 6177330 (2001-01-01), Yasuda
patent: 6197679 (2001-03-01), Hattori
patent: 6255189 (2001-07-01), Muller et al.
patent: 6323560 (2001-11-01), Narimatsu et al.
patent: 6342735 (2002-01-01), Colelli et al.
patent: 6350548 (2002-02-01), Leidy et al.
patent: 6420791 (2002-07-01), Huang et al.
patent: 6420971 (2002-07-01), Leck et al.
patent: 6421124 (2002-07-01), Matsumoto et al.
patent: 6445453 (2002-09-01), Hill
patent: 6458605 (2002-10-01), Stirton
patent: 6462818 (2002-10-01), Bareket
patent: 6476920 (2002-11-01), Scheiner et al.
patent: 6486954 (2002-11-01), Mieher et al.
patent: 6522406 (2003-02-01), Rovira et al.
patent: 6590656 (2003-07-01), Xu et al.
patent: 6611330 (2003-08-01), Lee et al.
patent: 6633831 (2003-10-01), Nikoonahad et al.
patent: 6699624 (2004-03-01), Niu et al.
patent: 6713753 (2004-03-01), Rovira et al.
patent: 6767680 (2004-07-01), Schulz
patent: 6772084 (2004-08-01), Bischoff et al.
patent: 6813034 (2004-11-01), Rosencwaig et al.
patent: 6815232 (2004-11-01), Jones et al.
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6867870 (2005-03-01), Mihaylov et al.
patent: 6888632 (2005-05-01), Smith
patent: 6900892 (2005-05-01), Shchegrov et al.
patent: 6919964 (2005-07-01), Chu
patent: 6949462 (2005-09-01), Yang et al.
patent: 6982793 (2006-01-01), Yang et al.
patent: 6992764 (2006-01-01), Yang et al.
patent: 7042569 (2006-05-01), Sezginer et al.
patent: 7046361 (2006-05-01), Yang et al.
patent: 7046376 (2006-05-01), Sezginer
patent: 7061615 (2006-06-01), Lowe-Webb
patent: 7061627 (2006-06-01), Opsal et al.
patent: 7080330 (2006-07-01), Choo et al.
patent: 7242477 (2007-07-01), Mieher et al.
patent: 7280212 (2007-10-01), Mieher et al.
patent: 7289213 (2007-10-01), Mieher et al.
patent: 7298481 (2007-11-01), Mieher et al.
patent: 7301634 (2007-11-01), Mieher et al.
patent: 2002/0054290 (2002-05-01), Vurens et al.
patent: 2002/0072001 (2002-06-01), Brown et al.
patent: 2002/0093648 (2002-07-01), Nikoonahad et al.
patent: 2002/0135875 (2002-09-01), Niu et al.
patent: 2002/0149782 (2002-10-01), Raymond
patent: 2002/0158193 (2002-10-01), Sezginer et al.
patent: 2002/0192577 (2002-12-01), Fay et al.
patent: 2003/0002043 (2003-01-01), Abdulhalim et al.
patent: 2003/0011786 (2003-01-01), Levy et al.
patent: 2003/0020184 (2003-01-01), Ballarin
patent: 2003/0156276 (2003-08-01), Bowes
patent: 2003/0223630 (2003-12-01), Adel et al.
patent: 2004/0129900 (2004-07-01), Den Boef et al.
patent: 2005/0012928 (2005-01-01), Sezginer et al.
patent: 2005/0122516 (2005-06-01), Sezginer et al.
patent: 2005/0157297 (2005-07-01), Abdulhalim et al.
patent: 2005/0286051 (2005-12-01), Sezginer et al.
patent: 2006/0193630 (2006-08-01), Dishon et al.
patent: 1400855 (2004-03-01), None
patent: 63-248804 (1988-10-01), None
patent: 11-86332 (1999-03-01), None
patent: 60-126881 (2006-07-01), None
patent: WO/85/04266 (1985-09-01), None
patent: WO/95/02200 (1995-01-01), None
patent: WO 99/45340 (1999-09-01), None
patent: WO/9956174 (1999-11-01), None
patent: WO01/84382 (2001-11-01), None
patent: WO 01/97279 (2001-12-01), None
patent: WO/0215238 (2002-02-01), None
patent: WO02/25708 (2002-03-01), None
patent: WO 02/25723 (2002-03-01), None
patent: WO/0218871 (2002-03-01), None
patent: WO 02/35300 (2002-05-01), None
patent: WO 0250509 (2002-06-01), None
patent: WO 02/065545 (2002-08-01), None
patent: WO02/65545 (2002-08-01), None
patent: WO02/069390 (2002-09-01), None
patent: WO 02/084213 (2002-10-01), None
patent: WO02/084213 (2002-10-01), None
patent: WO 03/001297 (2003-01-01), None
patent: WO03042629 (2003-05-01), None
patent: WO/03054475 (2003-07-01), None
TDB, “Mask Overlay Determination,” IBM Technical Disclosure Bulletin, Dec. 1978, pp. 2772-2773. www.delphion.com.
Kim, Young-Chang et al., “Automatic In-Situ Focus Monitor Using Line Shortening Effect,” Journal: Proceedings of the SPIE, vol. 3677, pt. 1-2, pp. 184-193.
Sherman, Enrique R., “Characterization and Monitoring of Variable NA and Variable Coherence Capable Photo Steppers Utilizing the Phase Shift Focus Monitor Reticle,” Journal: Proceedings of the SPIE, vol. 2439, pp. 61-69.
Bischoff, Jorg et al., “Modeling of Optical Scatterometry with Finite-Number-of-Periods Grating,” Journal: Proceedings of the SPIE, vol. 3743, pp. 41-48.
Uchida, Norio et al., “A Mask to Wafer Alignment and Gap Setting Method for X-Ray Lithography Using Gratings,” Journal: Journal of Vacuum Science & Technology B, vol. 9, No. 6, pp. 3202-3206.
Ina, Hidecki et al., “Alignment Mark Optimization to Reduce Tool and Wafer-induced Shift to XTRA-1000,” Japanese Journal of Applied Physics, vol. 38, No. 12B, pp. 7065-7070.
Baumbach, T. et al., “Grazing Incidence Diffraction by Laterally Patterned Semiconductor Nanostructures,” Journal: Journal of Physics, vol. 32, No. 6,
Adel Michael E.
Bareket Noah
Bevis Christopher F.
Dececco Paola
Fielden John
KLA-Tencor Technologies Corp.
Lauchman Layla G.
Stock, Jr. Gordon J.
Weaver Austin Villeneuve & Sampson LLP
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