Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2007-11-27
2007-11-27
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
Reexamination Certificate
active
10785821
ABSTRACT:
Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an interferometer is employed to modulate substantially a plurality of wavelengths of a broadband source and then acquiring one or more images of the periodic targets. There are predefined offsets between the first and second structures. An overlay error between the first and second structures is then determined by analyzing the one or more acquired images from the periodic targets using a scatterometry overlay technique based on the predefined offsets.
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Adel Michael E.
Bareket Noah
Bevis Christopher F.
Fabrikant Anatoly
Fielden John
Beyer & Weaver, LLP
KLA-Tencor Technologies Corporation
Stock, Jr. Gordon J.
Toatley , Jr. Gregory J.
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