Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2007-12-21
2010-02-16
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
Reexamination Certificate
active
07663753
ABSTRACT:
Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb; target C is designed to have an offset Xc; and target D is designed to have an offset Xd. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd. The targets A, B, C and D are illuminated with electromagnetic radiation to obtain spectra SA, SB, SC, and SDfrom targets A, B, C, and D, respectively. Any overlay error between the first structures and the second structures is then determined using a linear approximation based on the obtained spectra SA, SB, SC, and SD.
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Kim, Young-Chang et al., “Automatic In-Situ Focus Monitor Using Lin
Adel Michael
Bareket Noah
Bevis Christopher F.
Dececco Paola
Dziura Thaddeus G.
Chowdhury Tarifur
KLA-Tencor Technologies Corporation
Stock, Jr. Gordon J
Weaver Austin Villeneuve & Sampson LLP.
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