Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2011-04-26
2011-04-26
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
Reexamination Certificate
active
07933016
ABSTRACT:
Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. A plurality of targets is provided. Each target includes a portion of the first and second structures and each is designed to have an offset between its first and second structure portions. The targets are illuminated with electromagnetic radiation to thereby obtain spectra from each target at a −1stdiffraction order and a +1stdiffraction order. It is determined whether there are any overlay error between the first structures and the second structures using a scatterometry technique based on the detected spectra by (i) for each target, determining a first differential intensity between the −1stdiffraction order and a +1stdiffraction order, (ii) for a plurality of pairs of targets each having a first target and a second target, determining a second differential intensity between the first differential intensity of the first target and the first differential intensity of the second target, and (iii) determining any overlay error between the first structures and the second structures using a scatterometry technique based on the second differential intensities determined from each target pair.
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Adel Michael
Bareket Noah
Bevis Christopher F.
deCecco Paola
Dziura Thaddeus G.
Chowdhury Tarifur
KLA-Tencor Technologies Corporation
Stock, Jr. Gordon J
Weaver Austin Villeneuve & Sampson LLP
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