Apparatus and method using waveform shaping for reducing high fr

Details Apparatus and method using waveform shaping for reducing high fr Apparatus and method using waveform shaping for reducing high fr

1997-04-24

1999-09-14

Wong, Peter S.

Electricity: power supply or regulation systems

Output level responsive

Using a three or more terminal semiconductive device as the...

323271, 323285, 307 24, G05F 140, H02T 110

Patent

active

059528176

ABSTRACT:
A low-noise switching regulator and a method for driving an inductive load, employing current slew control and voltage slew control, is provided. Open and closed loop embodiments, as well as first and higher order slewing, are also provided.

REFERENCES:
patent: 4633150 (1986-12-01), Inaji et al.
patent: 4823070 (1989-04-01), Nelson
patent: 5191269 (1993-03-01), Carobolante
patent: 5196771 (1993-03-01), Naito
patent: 5614797 (1997-03-01), Carobolante
patent: 5708379 (1998-01-01), Yosinski
patent: 5731692 (1998-03-01), Garcia
Type 535A-545A Cathode Ray Oscilloscope Instruction Manual, Tektronix, Inc., pp. 4-19 to 4-20 (1960).
Type 453 Oscilloscope Instruction Manual, Tektronix, Inc., pp. 3-16 to 3-17 (1965).
Kenneth Arthur, Power Supply Circuits, pp. 115-123 (1969).
Type 7704A Oscilloscope Instruction Manual, Tektronix, Inc., pp. 2-34 to 2-37 (1973).
"Design DC-DC Converters To Catch Noise At The Source," Electronic Design, pp. 229-234 (Oct. 15, 1981).
"Conversion Techniques Adapt Voltages To Your Needs," EDN, pp. 155-168 (Nov. 10, 1982).
Application Note 29, Linear Technology (Oct. 1988).

Affiliated with

Also associated with

Rating

Apparatus and method using waveform shaping for reducing high fr does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method using waveform shaping for reducing high fr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method using waveform shaping for reducing high fr will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1513209