Apparatus and method using optical diffraction to measure surfac

Details Apparatus and method using optical diffraction to measure surfac Apparatus and method using optical diffraction to measure surfac

1994-10-12

1996-01-30

Turner, Samuel A.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356371, G01B 902

Patent

active

054884764

ABSTRACT:
Apparatus for measuring surface roughness utilizes diffraction patterns derived from the surface under test. The energies in the different orders are detected and processed utilizing various different algorithms dependent upon a number of factors such as the number of orders in the diffraction pattern and asymmetry in the diffraction pattern. Various filter functions both for the diffraction pattern itself and for values of surface roughness after measurement are disclosed. One algorithm for measuring surface roughness involves comparison of values representing the energy orders with reference values, preferably reference values obtained by an interpolation operation between one set of reference values representative of a diffraction pattern from a symmetrical surface and another set representative of a diffraction pattern from an asymmetrical surface.

REFERENCES:
patent: 4846578 (1989-07-01), Morita et al.
patent: 5106192 (1992-04-01), Tucker et al.
Optical Engineering, vol. 24, No. 3, May/Jun. 1985 (Bellingham, Wash.), R. Brodmann et al.: "Optical roughness measuring instrument for fine-machined surfaces," pp. 408-413.
Patent Abstracts of Japan, vol. 10, No. 250 (P-491) (2306), 28 Aug. 1986, & JP, A, 6180010 (Hitachi Ltd) 23 Apr. 1986.
Patent Abstracts of Japan, vol. 8, No. 75 (P-266)(1512), 7 Apr. 1984, & JP. A. 58221104 (Hitashi Seisakusho K.K.) 22 Dec. 1983.
Patent Abstracts of Japan, vol. 10, No. 250 (P-491)(2306), 28 Aug. 1986, & JP, A, 6177709 (Omron Tateisi Electronics Co.), 21 Apr. 1986.
Patent Abstracts of Japan, vol. 11, No. 9 (P-534) (2456), 10 Jan. 1987, & JP, A, 61186829 (Victor Co. of Japan Ltd.), 20 Aug. 1986.

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