Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1993-06-30
1996-04-02
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250306, 250307, H01J 3726
Patent
active
055043380
ABSTRACT:
An apparatus and method lithographically patterns an imaging layer using a predetermined pattern. The apparatus includes a cantilever having a tip attached thereto, which tip includes a conductive or semiconductive material. The apparatus also includes a scanning probe controller connected to the cantilever, which maintains the tip in contact with the imaging layer to be patterned. Substantially while the scanning probe controller maintains the tip in contact with the imaging layer, a voltage and/or current generator coupled to the tip selectively generates a voltage and/or current between the tip and the imaging layer to affect a physical change in the imaging layer based on the predetermined pattern. The physical change in the imaging layer can be exploited to fabricate integrated circuits, lithographic masks or micromechanical devices, for example. The scanning probe controller can also measure the topographical change in the imaging layer caused by the physical change using the same cantilever and tip.
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Dobisz Elizabeth A.
Marrian Christie R. K.
Snow Eric S.
Berman Jack I.
Kalish Daniel
McDonnell Thomas E.
Nguyen Kiet T.
The United States of America as represented by the Secretary of
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