Apparatus and method to improve the resolution of...

Details Apparatus and method to improve the resolution of... Apparatus and method to improve the resolution of...

2008-06-03

2008-06-03

Rosasco, S. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07381502

ABSTRACT:
A mask for use in a photolithographic process. The mask includes a plate or substrate having first and second opposite surfaces, a first image on the first surface of the substrate and a second image on the second surface of the substrate. When the mask is used in a photolithographic process, energy is reflected by the first image prior to entering the substrate and energy is reflected by the second image after passing through the substrate.

REFERENCES:
patent: 5387484 (1995-02-01), Doany et al.
patent: 6022645 (2000-02-01), Lin

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