Apparatus and method of line pattern analysis

Details Apparatus and method of line pattern analysis Apparatus and method of line pattern analysis

1983-01-19

1985-09-10

Boudreau, Leo H.

Image analysis

Histogram processing

For setting a threshold

356374, 250237G, G06K 900

Patent

active

045411131

ABSTRACT:
The disclosure herein describes an apparatus and a method of analysis of line patterns such as fingerprints, ideograms, or the like, which comprises the steps of superimposing a centrosymmetric reference pattern of lines over the line pattern to be analyzed to form an interferometric pattern of the moire type, positioning the reference pattern on a characteristic element of the line pattern to be analyzed, and enlarging it until the lines of the reference pattern fill the space between adjacent lines closest to the characteristic element to thereby translate the superimposed line patterns into a field pattern of different optical densities.

REFERENCES:
patent: 3419287 (1968-12-01), Rudie
patent: 3582889 (1971-06-01), Bodez
patent: 3584958 (1971-06-01), Miller
patent: 3771129 (1973-11-01), McMahon
patent: 3859633 (1975-01-01), Ho et al.
patent: 3893080 (1975-07-01), Ho et al.
patent: 4015240 (1977-03-01), Swonger et al.
patent: 4025898 (1977-05-01), Shaw
patent: 4149183 (1979-04-01), Pellar et al.
D. Montgomery, Fingerprint Classification Data, Mar. 1966, IBM Technical Disclosure Bulletin, vol. 8, No. 10, pp. 1356-1357.

Affiliated with

Also associated with

Rating

Apparatus and method of line pattern analysis does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method of line pattern analysis, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method of line pattern analysis will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1432879