Apparatus and method of exposing light to a semiconductor...

Details Apparatus and method of exposing light to a semiconductor... Apparatus and method of exposing light to a semiconductor...

2006-12-05

2006-12-05

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Image transferred to or from curved surface

C355S048000, C355S072000, C355S077000, C430S005000, C430S311000, C700S121000

Reexamination Certificate

active

07145633

ABSTRACT:
A semiconductor manufacturing station (50) exposes light on a surface area of a spherical semiconductor device or ball (52). A mask pattern generator (56) provides a pattern of light, which undergoes temporal changes to collectively represent an image. The mask pattern generator has an active exposure contour (80) that provides a portion of the overall image. The pattern of light is directed though a lens (62) to the surface area of the semiconductor device. The semiconductor device rotates in relation to the temporal changes in the pattern of light to expose the pattern of light over a portion of a surface area of the semiconductor device. The exposure contour has a narrower center and becomes wider moving away from the center. The exposure contour may have a curvature.

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