Apparatus and method of detecting endpoint of a dielectric etch

Details Apparatus and method of detecting endpoint of a dielectric etch Apparatus and method of detecting endpoint of a dielectric etch

2005-01-18

2005-01-18

Mills, Gregory (Department: 1763)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C134S001100, C216S089000

Reexamination Certificate

active

06844205

ABSTRACT:
A system detects the clearing of a dielectric at a plurality of contact sites by measuring the surface voltage of the dielectric and comparing the surface voltage to a reference voltage set to a value that relates to the cleared contact sites. Another system detects the clearing of a dielectric at a plurality of contact sites on a substrate by measuring the rate of change of a substrate current during an etch process and ending the etch process when the rate of change is approximately zero. Another system detects the clearing of a dielectric at a contact site by measuring a substrate current during an etch process and ends the etch process when the measured substrate current exceeds a predetermined value.

REFERENCES:
patent: 4793895 (1988-12-01), Kaanta et al.
patent: 4812756 (1989-03-01), Curtis et al.
patent: 4878017 (1989-10-01), Williams
patent: 5151584 (1992-09-01), Ebbing et al.
patent: 5198072 (1993-03-01), Gabriel
patent: 5362356 (1994-11-01), Schoenborn
patent: 5458732 (1995-10-01), Butler et al.
patent: 5498974 (1996-03-01), Verkuil et al.
patent: 5504328 (1996-04-01), Bonser
patent: 5665166 (1997-09-01), Deguchi et al.
patent: 6005246 (1999-12-01), Kutamura et al.
patent: 6011404 (2000-01-01), Ma et al.
patent: 6097196 (2000-08-01), Verkuil et al.
patent: 3-74843 (1991-03-01), None
patent: 05251398 (1993-09-01), None
patent: 07086383 (1995-03-01), None

Affiliated with

Also associated with

Rating

Apparatus and method of detecting endpoint of a dielectric etch does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method of detecting endpoint of a dielectric etch, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method of detecting endpoint of a dielectric etch will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3404939