Apparatus and method of crystallizing amorphous silicon

Details Apparatus and method of crystallizing amorphous silicon Apparatus and method of crystallizing amorphous silicon

2008-04-15

2008-04-15

Padgett, Marianne (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

C427S555000, C438S487000, C438S798000, C438S799000, C117S008000, C117S010000

Reexamination Certificate

active

07357963

ABSTRACT:
A sequential lateral solidification apparatus includes a laser generator for generating and emitting a laser beam; an X-Y stage movable in two orthogonal axial directions; and a mask arranged between the laser generator and the X-Y stage. The mask has a plurality of slits through which the laser beam passes. An objective lens for scaling down the laser beam is arranged between the mask and the X-Y stage. A mask stage is connected to the mask for controlling minute movement of the mask for crystallizing amorphous silicon in one block.

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