Apparatus and method of cleaning a substrate

Details Apparatus and method of cleaning a substrate Apparatus and method of cleaning a substrate

2005-04-19

2005-04-19

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

C134S147000, C134S137000, C134S148000, C134S149000, C134S157000, C134S902000, C366S127000

Reexamination Certificate

active

06880563

ABSTRACT:
A cleaning apparatus is provided with a processing bath to be filled with a cleaning chemical, an ultrasonic oscillator, and a retainer for holding a substrate to be immersed into a cleaning chemical. The front surface of the substrate is cleaned while ultrasonic waves are radiated from the ultrasonic oscillator onto the back surface of the substrate.

REFERENCES:
patent: 4213344 (1980-07-01), Rose
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patent: 20010013355 (2001-08-01), Busnaina
patent: 20020166569 (2002-11-01), Harvey et al.
patent: 20030045098 (2003-03-01), Verhaverbeke et al.
patent: 4-286119 (1992-10-01), None
patent: 5-206095 (1993-08-01), None
patent: 10-116809 (1998-05-01), None
patent: 11-145099 (1999-05-01), None
Merriam-Webster's Collegiate Dictionary. Tenth edition. 1999. pp. 335, 1292.

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