Apparatus and method of cathodic arc deposition

Details Apparatus and method of cathodic arc deposition Apparatus and method of cathodic arc deposition

1990-12-10

1992-06-30

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

20429841, 427 37, C23C 1424, C23C 1432

Patent

active

051260301

ABSTRACT:
Cathodic arc deposition method and apparatus, including an arc evaporation source containing a film forming material. A substrate is arranged on the central axis line of and in front of the evaporation surface of the arc evaporation source. At least one magnet coil is arranged around the central axis line and between the arc evaporation source and the substrate.

REFERENCES:
patent: 4452686 (1984-06-01), Axenov et al.
patent: 4512867 (1985-04-01), Andreev et al.
patent: 4551221 (1985-11-01), Axenov et al.
patent: 4563262 (1986-01-01), Sablev et al.
patent: 4645895 (1987-02-01), Boxman et al.
A. S. Gilmour, Jr. et al., Proceedings IEEE, vol. 60, No. 8, Aug. 1972, p. 983.

Affiliated with

Also associated with

Rating

Apparatus and method of cathodic arc deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method of cathodic arc deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method of cathodic arc deposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1861667