Apparatus and method for X-ray analysis

X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis

Reexamination Certificate

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C378S079000

Reexamination Certificate

active

07123686

ABSTRACT:
An apparatus for X-ray analysis includes (1) a focusing optical system including an X-ray source, a specimen table and a two-dimensional X-ray detector, (2) a device for shifting the angle of incidence of X-rays relative to a specimen supported by the specimen table, (3) a device for moving the two-dimensional X-ray detector in parallel with a central axis of rotation of the specimen and (4) a mask arranged in front of the two-dimensional X-ray detector. The mask has a slit arranged on a line intersecting a plane rectangularly intersecting the central axis of rotation of the specimen and containing a central optical axis of incident X-rays. The mask is driven to move in parallel with the axis of rotation of the specimen so that measuring can be conducted.

REFERENCES:
patent: 5446777 (1995-08-01), Houtman
patent: 6285736 (2001-09-01), Dosho
patent: 2270230 (1994-03-01), None
patent: 04161843 (1992-06-01), None
patent: 9-229879 (1997-09-01), None
patent: 09229879 (1997-09-01), None
patent: 2000-146871 (2000-05-01), None
patent: 2000146872 (2000-05-01), None

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