Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-01-14
2000-05-02
Lund, Jeffrie R
Coating apparatus
Gas or vapor deposition
With treating means
118723E, 118723ER, 118723I, 118723MP, 118724, 118725, 118715, 1341041, C23C 1600
Patent
active
060559276
ABSTRACT:
An apparatus and method for reducing the production of white powder in a process chamber used for depositing silicon nitride. Steps of the method include heating at least a portion of a wall of the process chamber; providing a liner covering a substantial portion of a wall of the process chamber; providing a remote chamber connected to the interior of the process chamber; causing a plasma of cleaning gas in the remote chamber; and flowing a portion of the plasma of cleaning gas into the process chamber. The apparatus includes a deposition chamber having walls; means for heating the walls, the means thermally coupled to the walls; a liner covering a substantial portion of the walls; a remote chamber disposed outside of the chamber; an activation source adapted to deliver energy into the remote chamber; a first conduit for flowing a precursor gas from a remote gas supply into the remote chamber where it is activated by the activation source to form a reactive species; and a second conduit for flowing the reactive species from the remote chamber into the deposition chamber.
REFERENCES:
patent: 4051382 (1977-09-01), Ogawa et al.
patent: 4446815 (1984-05-01), Kalbskopf et al.
patent: 4461783 (1984-07-01), Yamazaki et al.
patent: 4624214 (1986-11-01), Suzuki et al.
patent: 4724160 (1988-02-01), Arvidson et al.
patent: 4771730 (1988-09-01), Tezuka
patent: 5015330 (1991-05-01), Okumura et al.
patent: 5154135 (1992-10-01), Ishihara
patent: 5254171 (1993-10-01), Hayakawa et al.
patent: 5366585 (1994-11-01), Robertson et al.
patent: 5449444 (1995-09-01), Yoshikawa
patent: 5453125 (1995-09-01), Krogh
patent: 5472508 (1995-12-01), Saxena
patent: 5558717 (1996-09-01), Zhao et al.
patent: 5651826 (1997-07-01), Takagi
patent: 5653806 (1997-08-01), Van Buskirk
patent: 5788778 (1998-08-01), Shang et al.
patent: 5804923 (1998-09-01), Iio et al.
patent: 5812403 (1998-09-01), Fong et al.
patent: 5834371 (1998-11-01), Ameen et al.
patent: 5846332 (1998-12-01), Zhao et al.
patent: 5882411 (1999-03-01), Zhao et al.
patent: 5895548 (1999-04-01), Ettinger et al.
Law Kam S.
Maydan Dan
Robertson Robert McCormick
Shang Quanyuan
Applied Komatsu Technology Inc.
Lund Jeffrie R
Morris Birgit E.
LandOfFree
Apparatus and method for white powder reduction in silicon nitri does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus and method for white powder reduction in silicon nitri, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for white powder reduction in silicon nitri will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1585691