Apparatus and method for washing treatment

Details Apparatus and method for washing treatment Apparatus and method for washing treatment

1996-06-26

1999-02-09

Knode, Marian C.

Cleaning and liquid contact with solids

Processes

With work or work parts movable during treatment

134 3, 134 32, 134 61, B08B 310, B08B 700, C23G 102

Patent

active

058688650

ABSTRACT:
Disclosed is an apparatus for washing treatment which comprises a washing solution supply source filled with a washing solution required for chemical washing of a wafer, a spin chuck for rotatably holding a wafer to be treated, a nozzle communicating with the washing solution supply source, for supplying a washing solution from the washing solution supply source onto the wafer held on the spin chuck, temperature controlling device for controlling the temperature of the washing solution to be supplied to the wafer from the nozzle, and a temperature controlled cover closely provided so as to cover the wafer held on the spin chuck, for preventing a substantial temperature variation of the washing solution present on the wafer.

REFERENCES:
patent: 4827867 (1989-05-01), Takei et al.
patent: 5020200 (1991-06-01), Mimisaka et al.
patent: 5348893 (1994-09-01), Yamagishi
patent: 5395482 (1995-03-01), Onda et al.

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