Apparatus and method for treating process fluids

Gas and liquid contact apparatus – Contact devices – Injector type

Reexamination Certificate

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C261S078200, C239SDIG002

Reexamination Certificate

active

07354029

ABSTRACT:
A process fluid treating apparatus includes an ejector assembly fluidically connected to a process fluid supply assembly. A Coanda airfoil is located in the ejector assembly. Primary fluid is injected into the ejector duct to form a Coanda layer. A process fluid, or part of it, flows toward the ejector assembly through the process fluid assembly, which gradually turns that process fluid towards fluid treating channel formed adjacent to the Coanda layer. Shear and other forces and pressure gradients associated with the Coanda layer serve to pump or assist in pumping the process fluid from the source and to operate on the process fluid to atomize it, to pulverize, or de-agglomerize solid particles entrained in the process fluid, to produce high mass flow rate of the process fluid and to provide aerosol down to micron and sub micron mean droplet diameter size.

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patent: 1055210 (1913-03-01), Morison
patent: 1372740 (1921-03-01), Chandler
patent: 2905543 (1959-09-01), Schreter et al.
patent: 3665949 (1972-05-01), Rivard
patent: 3685614 (1972-08-01), Coanda et al.
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patent: 3972523 (1976-08-01), Brandes
patent: 4332529 (1982-06-01), Alperin
patent: 4369549 (1983-01-01), Sanders
patent: 4448354 (1984-05-01), Reznick et al.
patent: 6604694 (2003-08-01), Kordas et al.

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