Apparatus and method for treating and impregnating porous...

Details Apparatus and method for treating and impregnating porous... Apparatus and method for treating and impregnating porous...

2006-11-28

2006-11-28

Lamb, Brenda A. (Department: 1734)

Coating apparatus

With vacuum or fluid pressure chamber

C015S302000, C015S319000

Reexamination Certificate

active

07141118

ABSTRACT:
Apparatus and method for treating by injecting a fluid treatment material into porous structures such as those formed from concrete, brick, stone, marble, and wood. The apparatus includes an applicator head having an inner chamber and an outer chamber surrounding the inner chamber both of which chambers are connected with a vacuum source. The inner chamber is also connected with a source of pressurized liquid treatment material. The method is for treating such porous structures and includes the steps of engaging the structures with the applicator head, drawing a vacuum on at least the outer chamber to secure the applicator head to the structure, and supplying the pressurized liquid treatment material to the inner chamber to impregnate the structure to be treated.

REFERENCES:
patent: 3705437 (1972-12-01), Rukavina et al.
patent: 3747155 (1973-07-01), Koellisch
patent: 3958298 (1976-05-01), Cannan
patent: 4457042 (1984-07-01), Jones et al.
patent: 4720889 (1988-01-01), Grave
patent: 4756048 (1988-07-01), Kauffeldt et al.
patent: 5349722 (1994-09-01), Chayer
patent: 6269517 (2001-08-01), Dornier
patent: 6370728 (2002-04-01), Burns
patent: 6725497 (2004-04-01), Konrad

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