Electric heating – Metal heating – By arc
Patent
1989-03-31
1990-02-20
Paschall, M. H.
Electric heating
Metal heating
By arc
21912148, 21912147, 21912159, 427 34, 427 451, 118 501, B23K 900
Patent
active
049028707
ABSTRACT:
An RF plasma gun has a metal annular support ring at the gun's nozzle exit port. The ring is conductively mounted to a metal tank containing a substrate to be processed. The substrate is connected to a manipulator which is electrically isolated from the tank. A DC voltage is impressed between the tank, which contains an inert atmosphere at a pressure below that of ambient atmosphere, and the manipulator. The tank is placed at ground potential and the manipulator at a negative potential relative to the tank. The DC voltage creates an electric arc which flows from the exit port ring via the plasma to the substrate for cleaning the substrate.
REFERENCES:
patent: 3839618 (1974-10-01), Muehlberger
patent: 3961103 (1976-06-01), Aisenberg
patent: 4039416 (1977-08-01), White
patent: 4298629 (1981-11-01), Nozaki et al.
patent: 4401054 (1983-08-01), Matsuo et al.
patent: 4438368 (1984-03-01), Abe et al.
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4642440 (1987-02-01), Schnackel et al.
patent: 4715937 (1987-12-01), Moslehi et al.
patent: 4775547 (1988-10-01), Siemers
patent: 4782884 (1988-11-01), Siemers
patent: 4786566 (1988-11-01), Siemers
patent: 4795880 (1989-01-01), Hayes et al.
patent: 4805833 (1989-02-01), Siemers
Frind Gerhard
Rutkowski Stephen F.
Siemers Paul A.
Davis Jr. James C.
General Electric Company
Paschall M. H.
Webb II Paul R.
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