Apparatus and method for transfer arc cleaning of a substrate in

Electric heating – Metal heating – By arc

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Details

21912148, 21912147, 21912159, 427 34, 427 451, 118 501, B23K 900

Patent

active

049028707

ABSTRACT:
An RF plasma gun has a metal annular support ring at the gun's nozzle exit port. The ring is conductively mounted to a metal tank containing a substrate to be processed. The substrate is connected to a manipulator which is electrically isolated from the tank. A DC voltage is impressed between the tank, which contains an inert atmosphere at a pressure below that of ambient atmosphere, and the manipulator. The tank is placed at ground potential and the manipulator at a negative potential relative to the tank. The DC voltage creates an electric arc which flows from the exit port ring via the plasma to the substrate for cleaning the substrate.

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