Apparatus and method for thermally controlled processing of...

Coating apparatus – Immersion or work-confined pool type – With means for moving work through – into or out of pool

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C118S429000

Reexamination Certificate

active

10295302

ABSTRACT:
Apparatus and method for thermally controlled processing of microelectronic workpieces with liquids. An apparatus in accordance with and embodiment of the invention includes a process vessel configured to carry a processing liquid, such as an electroless processing liquid. The vessel has a thermally transmissive wall for transferring heat to and/or from the processing liquid within. A heat transfer device, such as a reservoir that receives processing liquid spilling over from the process vessel, transfers heat to or from the processing liquid within the process vessel. The heat transfer device can also transfer heat to or from an internal or external heat source, such as a conduit carrying a heat transfer fluid, or an electrical resistance heater. The interaction between the microelectronic workpiece and the processing liquid can be further controlled by controlling the rate at which the microelectronic workpiece rotates and/or the manner in which the microelectronic workpiece is introduced to and/or withdrawn from the processing liquid.

REFERENCES:
patent: 2658839 (1953-11-01), Talmey et al.
patent: 2791516 (1957-05-01), Chambers et al.
patent: 3385725 (1968-05-01), Schmeckenbecher
patent: 4594273 (1986-06-01), Doss et al.
patent: 4655162 (1987-04-01), Kameyama
patent: 4791880 (1988-12-01), Aigo
patent: 5235995 (1993-08-01), Bergman et al.
patent: 5741362 (1998-04-01), Kobayashi
patent: 5938845 (1999-08-01), Ang
patent: 6042712 (2000-03-01), Mathieu
patent: 6294059 (2001-09-01), Hongo et al.
patent: 6551412 (2003-04-01), Huang
patent: 6555298 (2003-04-01), Rolfson
patent: 6716330 (2004-04-01), Hongo et al.
International Search Report for International Application No. PCT/US03/22174; Applicant: Semitool, Inc., 4 pgs. (Oct. 2003).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for thermally controlled processing of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for thermally controlled processing of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for thermally controlled processing of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3858177

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.