Apparatus and method for thermal processing of substrate

Details Apparatus and method for thermal processing of substrate Apparatus and method for thermal processing of substrate

2011-05-03

2011-05-03

Pelham, Joseph M (Department: 3742)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C219S413000, C219S502000, C392S416000, C374S131000

Reexamination Certificate

active

07935913

ABSTRACT:
A thermal processing apparatus (1) comprises a chamber body (6), a holding part (7) for holding a substrate (9) inside the chamber body (6), a light emitting part (5) for heating the substrate (9) through light irradiation and a light measuring part (2) for measuring light energy. The light measuring part (2) comprises a calorimeter (24) disposed outside the chamber body (6), a light guide structure (20) for guiding the light inside the chamber body (6) to the calorimeter (24) and a calculation part (25) for performing computations on the basis of an output of the calorimeter (24). In the thermal processing apparatus (1), by measuring the light from the light emitting part (5) by the calorimeter (24), it is possible to measure the energy of light emitted from the light emitting part (5) during thermal processing inside chamber body (6) and obtain a surface temperature of the substrate (9) by the calculation part (25).

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