Apparatus and method for the removal of contaminants in gases

Gas separation: processes – Solid sorption – Inorganic gas or liquid particle sorbed

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

55302, 95148, 95280, 96144, 96146, 96154, B01D 5304

Patent

active

059481439

ABSTRACT:
An apparatus and method are described for removing vapor phase contaminants from a gas stream by placing a porous tube having a sorbent material into ductwork through which the gas stream passes. In a first mode of operation, vapor phase contaminants are adsorbed by the sorbent. In a second mode of operation, the porous tube is cleaned of any accumulated deposits, for example fly ash, while in place without having to stop the gas flow. In a third mode of operation, the sorbent can be regenerated in place and without having to stop the gas flow by heating and collecting the desorbed contaminants. This invention is particularly suited for the removal of vapor phase mercury from flue gas generated by a combustion process.

REFERENCES:
patent: 2215323 (1940-09-01), Guthrie
patent: 3608273 (1971-09-01), Fabuss et al.
patent: 3693323 (1972-09-01), Gant
patent: 4419107 (1983-12-01), Roydhouse
patent: 4889698 (1989-12-01), Moller et al.
patent: 5141724 (1992-08-01), Audeh
patent: 5409522 (1995-04-01), Durham
patent: 5419884 (1995-05-01), Weekman et al.
patent: 5505766 (1996-04-01), Chang
patent: 5628819 (1997-05-01), Mestemaker et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for the removal of contaminants in gases does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for the removal of contaminants in gases, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for the removal of contaminants in gases will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1800534

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.