Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – For forming a platelet shape or a small diameter – elongate,...
Reexamination Certificate
2008-01-29
2008-01-29
Kunemund, Robert (Department: 1722)
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
For forming a platelet shape or a small diameter, elongate,...
C117S084000, C117S089000, C117S200000, C117S951000, C118S716000
Reexamination Certificate
active
07323052
ABSTRACT:
An apparatus and method for growing bulk single crystals of silicon carbide is provided. The apparatus includes a sublimation chamber with a silicon vapor species phase outlet that allows the selective passage of atomic silicon vapor species while minimizing the concurrent passage of other vapor phase species. The apparatus can provide control of vapor phase stoichiometry within the sublimation chamber, which in turn can allow the production of bulk silicon carbide single crystals with reduced intrinsic point defects concentration.
REFERENCES:
patent: RE34861 (1995-02-01), Davis et al.
patent: 5895526 (1999-04-01), Kitoh et al.
patent: 5968261 (1999-10-01), Barrett et al.
patent: 6086672 (2000-07-01), Hunter
patent: 6193797 (2001-02-01), Shiomi et al.
patent: 6406539 (2002-06-01), Shigeto et al.
patent: 6749685 (2004-06-01), Coleman
patent: 2002/0096108 (2002-07-01), Kuhn et al.
patent: 2006/0144324 (2006-07-01), Sakaguchi et al.
J. Zhang et al; “Electrically active defects in n-type 4H-silicon carbide grown in a vertical hot-wall reactor”; Journal of Applied Physics, Apr. 15, 2003; vol. 93, No. 8; pp. 4708-4714.
Y. Negoro et al; “Stability of deep centers in 4H-SiC epitaxial layers during thermal annealing”; Applied Physics Letters; Sep. 6, 2004; vol. 85, No. 10; pp. 1716-1718.
Steven Denbaars et al; “Wide-Bandgap Semiconductors for High Power, High Frequency and High Temperature”; Materials Research Society; 1998; Symposium Proceedings vol. 512; Cover page and pp. 89-99.
Jenny Jason Ronald
Malta David Phillip
Tsvetkov Valeri F.
Cree Inc.
Kunemund Robert
Summa, Allan & Additon, P.A.
LandOfFree
Apparatus and method for the production of bulk silicon... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus and method for the production of bulk silicon..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for the production of bulk silicon... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2805168